• High-Potency Cica Complex for Multi-Layered Care: Contains a 50%+ concentration of Centella Asiatica extract (including active compounds like asiaticoside, madecassic acid) — this complex not only soothes acute inflammation (e.g., redness, itching) but also promotes the synthesis of collagen and ceramide, repairing the skin’s protective barrier from the root to enhance long-term tolerance.
• Lightweight, Non-Greasy Essence Texture: The essence is transparent and watery, with no sticky residue after application. It absorbs quickly into the skin, making it suitable for oily/acne-prone skin (no pore-clogging) and dry sensitive skin (no tightness after absorption). The formula avoids heavy oils that may irritate damaged skin.
• Ultra-Soft, Skin-Friendly Film Cloth: Uses medical-grade ultra-fine cellulose film cloth, which is thinner than traditional mask sheets (0.1mm thickness) and fits the skin like a "second skin" — it has strong essence retention (holding 22g of concentrated Cica essence) and reduces friction on sensitive skin, avoiding secondary irritation.
• Mild, Additive-Free Formula: Free of alcohol (ethanol), synthetic fragrances, parabens, mineral oil, sulfates, and artificial colorants. The pH is adjusted to 5.0-5.5 (close to the skin’s natural acid mantle), ensuring compatibility with even low-tolerance skin. It has passed dermatological patch testing, with no irritation reported.
• Single-Use for Freshness & Convenience: The individual packaging ensures each mask is fresh (no essence oxidation) and hygienic (prevents bacterial contamination). It is compact and portable, ideal for travel, office touch-ups, or post-procedure emergency care — no need to worry about leftover product spoilage.

• All skin types

• Made in :Korea

（specific ingredients are subject to product packaging; the following are core and common components）：
Core Active Ingredient:
Centella Asiatica Extract (50%+): The key functional ingredient, extracted via low-temperature supercritical extraction to retain active compounds (asiaticoside, madecassic acid, asiatic acid). It soothes inflammation by inhibiting the release of pro-inflammatory factors, promotes fibroblast activity to repair the skin barrier, and reduces redness and itching.
Soothing & Barrier-Repairing Ingredients:
Panthenol (Vitamin B5): Converts to pantothenic acid in the skin, which penetrates the stratum corneum to soothe mild irritation, repair micro-damage, and improve skin moisture retention — synergizing with Centella Asiatica to enhance repair effects.
Ceramide NP: A key component of the skin barrier, replenishes the lipid gap in damaged skin, prevents moisture loss, and strengthens the skin’s resistance to external stimuli (e.g., pollution, dryness).
Allantoin: A gentle soothing agent that promotes skin cell renewal, relieves dryness and peeling caused by barrier damage, and reduces the stinging sensation of sensitive skin.
Hydrating Ingredients:
Sodium Hyaluronate (Multi-Molecular-Weight): Low-molecular-weight HA replenishes deep moisture, medium-molecular-weight HA hydrates the epidermis, and high-molecular-weight HA forms a protective film on the surface — avoiding dryness while soothing.
Glycerin: A basic humectant that attracts moisture from the air, maintains the essence’s hydration effect, and improves the film cloth’s spreadability without causing greasiness.
Film Cloth & Base Ingredients:
Medical-Grade Cellulose Fiber: The material of the mask sheet, which is non-toxic, non-irritating, and has strong biocompatibility. It fits closely to the skin and absorbs essence efficiently, ensuring active ingredients are delivered fully.
Xanthan Gum: A natural thickener that adjusts the essence’s viscosity, preventing it from dripping and ensuring even distribution on the film cloth.
Disodium EDTA: A mild chelating agent that binds to metal ions in the formula, preventing oxidation of Centella Asiatica extract and active ingredients, and maintaining product stability.
Preservative:
Phenoxyethanol: A mild, low-irritation preservative that inhibits the growth of bacteria and fungi in the essence, extending the product’s shelf life (compliant with international safety limits for skincare products).
Harsh Substance-Free: Free of alcohol (ethanol), synthetic fragrances, parabens, mineral oil, sulfates, phthalates, and artificial colorants — ensuring the formula is safe for sensitive, damaged, or low-tolerance skin.

Skin Prep (Gentle is Key): Cleanse the face with a mild, non-foaming cleanser (avoid scrubbing or using hot water, which may irritate sensitive skin) and pat dry with a soft towel. Do not apply toner or serum with alcohol/acid before use — skip additional steps to avoid overloading the skin.
Unfold & Apply: Tear open the mask packet along the easy-tear line, take out the film cloth (remove the white support film first if present), and align the mask with the eyes, nose, and mouth. Gently press the mask from the center to the sides with your fingertips to eliminate air gaps, ensuring every part of the mask adheres to the skin.
Relax & Absorb (Avoid Overuse): Leave the mask on for 15-18 minutes. Do not exceed 20 minutes, as overuse may cause the mask to absorb moisture back from the skin (especially for dry sensitive skin). During this time, avoid facial movements (e.g., talking, smiling) to maintain adhesion.
Massage & Lock in (No Rinsing Needed): After removing the mask, gently massage the remaining essence on the face with your ring finger (the weakest finger, to avoid pressure) for 1-2 minutes until fully absorbed. Do not rinse — follow with a lightweight, fragrance-free moisturizer (preferably with ceramides or hyaluronic acid) to lock in the soothing ingredients and strengthen the barrier.
Usage Frequency: For acute irritation (e.g., post-acne or post-sun), use 1 time daily for 2-3 days until relief; for daily maintenance, use 1-2 times a week to enhance skin tolerance and prevent sensitivity.