SKIN1004 Madagascar Centella Hyalu-Cica Hydrating Mask 5pcs is a dual-effect sheet mask focusing on "deep hydration + barrier repair", specially developed for dry, dehydrated, or fragile skin (e.g., skin with seasonal dryness, post-sun dehydration, or barrier damage from over-cleansing). It takes two core ingredients as the base: first, high-purity Centella asiatica extract from Madagascar—rich in madecassoside and asiaticoside, which soothes dry irritation, accelerates the repair of damaged skin barriers, and enhances the skin’s moisture-locking ability; second, multi-molecular hyaluronic acid (including high-molecular, medium-molecular, and low-molecular hyaluronic acid)—this "hyaluronic acid matrix" can penetrate different layers of the skin: high-molecular hyaluronic acid forms a moisture-locking film on the surface to prevent water loss, medium-molecular hyaluronic acid replenishes moisture in the stratum corneum, and low-molecular hyaluronic acid reaches the deep skin to activate long-term hydration. The mask is also supplemented with panthenol and squalane to further enhance nourishment and moisture retention, avoiding dryness after hydration. The mask sheet is made of "ultra-soft microfiber" material with strong essence-locking ability and good breathability—it fits closely to facial contours (even around the nose wings and jawline) without stuffiness, ensuring that the hydrating and repairing essence is fully absorbed. It is free from parabens, artificial fragrances, alcohol, mineral oil, and synthetic colorants, making it suitable for all skin types, especially dry skin, dehydrated skin, and fragile skin in need of hydrating repair.

• All skin types

• Made in :Korea

1. Madagascar Centella Asiatica Extract: Core repair and soothing ingredient, rich in madecassoside and asiaticoside, soothes dry irritation, repairs damaged barriers, and enhances the skin’s moisture-locking ability. 2. Multi-Molecular Hyaluronic Acid (High-Molecular, Medium-Molecular, Low-Molecular): Core hydrating ingredient, forms a "moisture matrix" to replenish water in different skin layers, locks in moisture, and achieves long-term hydration. 3. Panthenol (Provitamin B5): Dual-effect ingredient for hydration and repair, relieves dry tightness, promotes skin barrier regeneration, and makes the skin tender and smooth. 4. Squalane: Natural moisturizing and nourishing ingredient, similar to skin sebum, replenishes skin lipids, enhances moisture retention, and avoids dryness after hydration. 5. Glycyrrhiza Glabra (Licorice) Root Extract: Mild soothing ingredient, reduces dry-induced sensitivity and redness, and maintains skin stability while hydrating.

1. Cleanse your face with a mild, non-irritating cleanser to remove surface dirt and oil, then gently pat dry with a clean towel (avoid vigorous rubbing to protect the skin barrier). 2. Tear open the single mask package along the pre-cut line, take out the mask sheet, and gently unfold it—remove the white protective films on both sides of the mask. 3. Align the mask with your facial contours (match the eye, nose, and mouth cutouts to the corresponding parts), then press lightly with your fingertips to eliminate air gaps, ensuring close adhesion (focus on dry areas such as cheeks, forehead, and around the mouth). 4. Leave the mask on for 15-20 minutes; do not extend the wearing time, as this may cause reverse moisture loss or reduce the hydrating effect. 5. Remove the mask sheet, then gently massage the remaining essence on your face and neck with your fingertips in circular motions until it is fully absorbed. No rinsing is required; follow up with a moisturizing cream (especially for dry skin) to lock in the hydrating essence and maintain long-term moisture.